Due to the high density and high degree of ionization of the plasma flow of a pulsed electric arc generator, traditional sources of electrical displacement of the substrate are ineffective. At the same time, the use of substrate bias has a positive effect, especially at the initial stage of the film deposition process. One of the ways to realize the electrical displacement of the substrate in this case can be the use of a capacitive storage of electrical energy connected between the technological equipment and the body of the chamber of the vacuum unit.

The BPS 150-30P120 power supply is designed to power the substrate electrical bias system in the processes of deposition of ta-C thin-film coatings using a pulsed electric arc generator of carbon plasma.

The power supply provides charging of an energy storage unit with a capacity of up to 800 μF installed in the substrate bias circuit at a pulse repetition rate of an arc discharge up to 120 Hz. The power supply has a synchronization input that allows synchronizing the charge-discharge cycle of the power supply of the plasma generator with the charge-discharge cycle of the electric displacement system in the slave mode.

Specifications:

Accumulator charging voltage	25 - 150 V
Max frequency of discharge pulses repetition when accumulator capacity equals 800 uF	120 Hz
Max power consumption	10 kW
Outer size	4U, D = 495 mm
Weight	25 kg